“Influence of Chemical Cleaning Procedures and Thermal Oxidation Processes on the Uniformity of MOS Gate Oxides on Abrupt Steps on Silicon Surfaces”. JSSE - Journal of Science & Sustainable Engineering 1, no. 1 (August 3, 2023). Accessed December 5, 2025. https://periodicos.unifesp.br/index.php/jsse/article/view/15261.